DocumentCode :
474294
Title :
Plasma Surface Modification of Polymer Substrates for Selective Hydrophobic Control
Author :
Avram, M. ; Avram, M.A. ; Bragaru, A. ; Ghiu, A. ; Iliescu, C.
Author_Institution :
Nat. Inst. for R&D in Microtechnol. (IMT-Bucharest), Bucharest
Volume :
1
fYear :
2007
fDate :
Oct. 15 2007-Sept. 17 2007
Firstpage :
91
Lastpage :
94
Abstract :
The main objective of this study is theoretical and experimental investigation of the surfaces modification of SU8, PDMS, SiO2 and Si by plasma RF treatment. Physical-chemical reactions at room temperature can be used for the modifications of the surfaces in plasma, by modifying the contact angle, superficial polymerization, or by creating hydrophilic regions and/or hydrophobic on the surfaces in contact with plasma. The argon-plasma annealing was used to generate the hydrophilic surfaces, and plasma of CF4 or CF4 with O2 has been used to create hydrophobic surfaces.
Keywords :
annealing; microfluidics; argon-plasma annealing; physical-chemical reactions; plasma surface modification; polymer substrates; selective hydrophobic control; superficial polymerization; Microchannel; Microfluidics; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma stability; Plasma temperature; Polymers; Surface topography; Surface treatment; Microfluidic; Polymers; RIE;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2007. CAS 2007. International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-0847-4
Type :
conf
DOI :
10.1109/SMICND.2007.4519654
Filename :
4519654
Link To Document :
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