Title :
RF MEMS Switches Supported by Polymeric Structures
Author :
Lucibello, Andrea ; Proietti, E. ; Catoni, S. ; Frenguelli, L. ; Marcelli, Romolo ; Bartolucci, G.
Author_Institution :
CNR-IMM Roma, Roma
fDate :
Oct. 15 2007-Sept. 17 2007
Abstract :
RF MEMS shunt switches in coplanar waveguide (CPW) configuration have been designed, realized and tested for wideband isolation purposes. SU-8 negative photo-resist technology has been introduced for improving the bridge mechanics and the RF performances of the device. The polymeric material is used to elevate the ground planes of the CPW structure, with minor consequences on the electrical matching and an improvement in the bridge ends definition. The EM design has been followed by a sixstep photolithographic process on a 4" oxidized high resistivity silicon wafer, up to the release of the bridge by using a plasma etching technique.
Keywords :
coplanar waveguides; microswitches; photolithography; sputter etching; CPW structure; RF MEMS shunt switches; SU-8 negative photo-resist technology; bridge mechanics; coplanar waveguide configuration; electrical matching; high resistivity silicon wafer; photolithographic process; plasma etching technique; polymeric structures; wideband isolation; Bridge circuits; Conductivity; Coplanar waveguides; Isolation technology; Polymers; Radio frequency; Radiofrequency microelectromechanical systems; Switches; Testing; Wideband; RF MEMS; SU-8; switches;
Conference_Titel :
Semiconductor Conference, 2007. CAS 2007. International
Conference_Location :
Sinaia
Print_ISBN :
978-1-4244-0847-4
DOI :
10.1109/SMICND.2007.4519696
