DocumentCode :
474414
Title :
Statistical regression for efficient high-dimensional modeling of analog and mixed-signal performance variations
Author :
Li, Xin ; Liu, Hongzhou
Author_Institution :
Dept. of ECE, Carnegie Mellon Univ., Pittsburgh, PA
fYear :
2008
fDate :
8-13 June 2008
Firstpage :
38
Lastpage :
43
Abstract :
The continuous technology scaling brings about high-dimensional performance variations that cannot be easily captured by the traditional response surface modeling. In this paper we propose a new statistical regression (STAR) technique that applies a novel strategy to address this high dimensionality issue. Unlike most traditional response surface modeling techniques that solve model coefficients from over-determined linear equations, STAR determines all unknown coefficients by moment matching. As such, a large number of (e.g., 103~105) model coefficients can be extracted from a small number of (e.g., 102~103) sampling points without over-fitting. In addition, a novel recursive estimator is proposed to accurately and efficiently predict the moment values. The proposed recursive estimator is facilitated by exploiting the interaction between different moment estimators and formulating the moment estimation problem into a special form that can be iteratively solved. Several circuit examples designed in commercial CMOS processes demonstrate that STAR achieves more than 20times runtime speedup compared with the traditional response surface modeling.
Keywords :
CMOS analogue integrated circuits; integrated circuit modelling; mixed analogue-digital integrated circuits; recursive estimation; regression analysis; CMOS processes; analog circuits; high-dimensional modeling; high-dimensional performance variations; mixed-signal circuits; moment estimators; moment matching; recursive estimator; statistical regression; technology scaling; CMOS process; Integrated circuit modeling; Manufacturing processes; Predictive models; Random variables; Recursive estimation; Response surface methodology; Semiconductor device modeling; Semiconductor process modeling; Space technology; Circuits; Process Variations; Response Surface Modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2008. DAC 2008. 45th ACM/IEEE
Conference_Location :
Anaheim, CA
ISSN :
0738-100X
Print_ISBN :
978-1-60558-115-6
Type :
conf
Filename :
4555778
Link To Document :
بازگشت