An integrated nonlinear placement framework with congestion and porosity aware buffer planning

Due to skewed scaling of interconnect versus cell delay in deep submicron CMOS, modern VLSI timing closure requires extensive buffer insertion. Inserting a large number of buffers may cause not only dramatic cell migration but also routing hotspots. If buffering is not controlled well, it may fail to close a design. Placement with buffer porosity (i.e., cell density) awareness can allocate space for inserting these buffers, and buffering with congestion awareness can improve the routability. Therefore, there is essential need for a placement framework with explicit porosity and congestion control. In this paper, we propose the first integrated nonlinear placement framework with porosity and congestion aware buffer planning. We demonstrate the integration of increasingly refined cell porosity and routing congestion aware buffer planning and insertion methodology in a high quality nonlinear placer. Our experiments show the improvement of average routing overflow by 69%, average wirelength by 28% and average buffer count by 40%, compared with the traditional placement framework without buffer planning.