Title :
Silicon oxynitride based photonics
Author :
Worhoff, Kerstin ; Klein, Edwin ; Hussein, Gamar ; Driessen, Alfred
Author_Institution :
Integrated Opt. Microsyst. group, Univ. of Twente, Enschede
Abstract :
Silicon oxynitride is a very attractive material for integrated optics. Besides possessing excellent optical properties it can be deposited with refractive indices varying over a wide range by tuning the material composition. In this contribution we will summarize the key properties of this material class and discuss several application examples. Preliminary results on novel processes, which will lead to largely reduced hydrogen incorporation and enable reflow of SiON material, are being presented.
Keywords :
CVD coatings; integrated optics; refractive index; chemical vapor deposition; hydrogen reduction; integrated optics; refractive indices; silicon oxynitride based photonics; Integrated optics; Optical films; Optical materials; Optical refraction; Optical sensors; Optical variables control; Optical waveguides; Photonics; Refractive index; Silicon; annealing; chemical vapor deposition; hydrogen reduction; integrated optical devices; silicon nitride; silicon oxynitride;
Conference_Titel :
Transparent Optical Networks, 2008. ICTON 2008. 10th Anniversary International Conference on
Conference_Location :
Athens
Print_ISBN :
978-1-4244-2625-6
Electronic_ISBN :
978-1-4244-2626-3
DOI :
10.1109/ICTON.2008.4598706
