Silicon oxynitride based photonics

Author

Worhoff, Kerstin ; Klein, Edwin ; Hussein, Gamar ; Driessen, Alfred

Author_Institution

Integrated Opt. Microsyst. group, Univ. of Twente, Enschede

Volume

3

fYear

2008

fDate

22-26 June 2008

Firstpage

266

Lastpage

269

Abstract

Silicon oxynitride is a very attractive material for integrated optics. Besides possessing excellent optical properties it can be deposited with refractive indices varying over a wide range by tuning the material composition. In this contribution we will summarize the key properties of this material class and discuss several application examples. Preliminary results on novel processes, which will lead to largely reduced hydrogen incorporation and enable reflow of SiON material, are being presented.

Keywords

CVD coatings; integrated optics; refractive index; chemical vapor deposition; hydrogen reduction; integrated optics; refractive indices; silicon oxynitride based photonics; Integrated optics; Optical films; Optical materials; Optical refraction; Optical sensors; Optical variables control; Optical waveguides; Photonics; Refractive index; Silicon; annealing; chemical vapor deposition; hydrogen reduction; integrated optical devices; silicon nitride; silicon oxynitride;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks, 2008. ICTON 2008. 10th Anniversary International Conference on

Conference_Location

Athens

Print_ISBN

978-1-4244-2625-6

Electronic_ISBN

978-1-4244-2626-3

Type

conf

DOI

10.1109/ICTON.2008.4598706

Filename

4598706