• DocumentCode
    47748
  • Title

    Sub-10-nm Asymmetric Junctionless Tunnel Field-Effect Transistors

  • Author

    Chun-Hsing Shih ; Nguyen Van Kien

  • Author_Institution
    Dept. of Electr. Eng., Nat. Chi Nan Univ., Nantou, Taiwan
  • Volume
    2
  • Issue
    5
  • fYear
    2014
  • fDate
    Sept. 2014
  • Firstpage
    128
  • Lastpage
    132
  • Abstract
    This study presents a new asymmetric junctionless tunnel field-effect transistor (AJ-TFET) to scale TFETs into sub-10-nm regimes. The asymmetric junctionless p+ source/body and junctional n/p+ drain/body separately optimize the lateral source and drain coupling to efficiently switch the TFETs, producing an abrupt on-off switching. Because of n-drain/p+body junction, the off-state tunnel barrier can be extended into the drain, ensuring an excellent short-channel effect without the limitation of channel lengths. Si/Ge heterojunctions and high-k gate insulators are combined with the AJ-TFETs for additional on-current boosting. Using compact structures and feasible parameters from practical Si-based CMOS technologies, the advancement in the on-off switching and short-channel effect make the AJ-TFET highly promising as an ideal approach into the sub-10-nm regimes.
  • Keywords
    CMOS integrated circuits; Ge-Si alloys; field effect transistors; insulators; tunnel transistors; CMOS; Si-Ge; TFET; high-k gate insulators; off-state tunnel barrier; short-channel effect; size 10 nm; CMOS integrated circuits; CMOS technology; IEEE Electron Devices Society; Logic gates; Silicon; Switches; Transistors; Asymmetric junctionless TFET; short-channel effect; subthreshold swing; tunnel field-effect transistor (TFET);
  • fLanguage
    English
  • Journal_Title
    Electron Devices Society, IEEE Journal of the
  • Publisher
    ieee
  • ISSN
    2168-6734
  • Type

    jour

  • DOI
    10.1109/JEDS.2014.2330501
  • Filename
    6832427