DocumentCode :
478885
Title :
Electric-field enhancement and ion-flux focusing at the multiwire cathode of a high-current plasma-filled diode
Author :
Nefedtsev, E.V. ; Ozur, G.E.
Author_Institution :
Inst. of High-Current Electron., Russian Acad. of Sci., Tomsk
Volume :
1
fYear :
2008
fDate :
15-19 Sept. 2008
Firstpage :
235
Lastpage :
238
Abstract :
The time evolution of an unsteady ion sheath in the presence of cylindrical protrusions at the cathode is studied numerically in a two-dimensional model. The calculations demonstrate the enhancement of the electric field and the focusing of the ion flow at the protrusion vertices. It is shown that, in the stage of the sheath formation, in addition to the electrostatic focusing of the ion flux, there is also focusing caused by the curvature of the plasma boundary around a protrusion. The results of calculations agree satisfactorily with the experimental data on the delay time of explosive emission at the multi-wire cathode of a high-current plasma-filled diode. For the case of planar cathode, the analytical formulas for maximum values of electric field strength and ion current density are obtained.
Keywords :
cathodes; electric fields; plasma boundary layers; plasma diodes; plasma sheaths; cylindrical protrusions; electric field strength; electric-field enhancement; electrostatic focusing; explosive emission; high-current plasma-filled diode; ion-flux focusing; multiwire cathode; plasma boundary; sheath formation; Cathodes; Current density; Delay effects; Diodes; Electrostatics; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sheaths; Poisson equations;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 2008. ISDEIV 2008. 23rd International Symposium on
Conference_Location :
Bucharest
ISSN :
1093-2941
Print_ISBN :
978-973-755-382-9
Electronic_ISBN :
1093-2941
Type :
conf
DOI :
10.1109/DEIV.2008.4676763
Filename :
4676763
Link To Document :
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