Title :
A CMOS-MEMS scanning probe microscope with integrated position sensors
Author :
Sarkar, Niladri ; Mansour, Raafat
Author_Institution :
Electr. & Comput. Eng., Univ. of Waterloo, Waterloo, ON
Abstract :
We report on an integrated scanning probe microscope (SPM) fabricated in a CMOS-MEMS process. The design of this device is driven by the requirements of an atomically precise manufacturing (APM) approach based on patterned atomic layer epitaxy (ALE). A scan range of 10 mum times 10 mum is achieved with in-plane electrothermal actuation, and the cantileverpsilas out-of-plane range of motion enables a 30 mum sample approach. A test structure to optimize the in-plane actuator design is preseented, and its results are compared to an FEA model. Piezoresistive strain gauges and temperature sensors are strategically located in the in-plane actuators and the out-of-plane cantilever for use in an off-chip closed-loop positioning system.
Keywords :
CMOS integrated circuits; cantilevers; finite element analysis; micromechanical devices; microsensors; scanning probe microscopy; temperature sensors; ALE; CMOS-MEMS scanning probe microscopy; FEA model; atomically precise manufacturing approach; in-plane electrothermal actuation; integrated position sensors; off-chip closed-loop positioning system; out-of-plane cantilever; patterned atomic layer epitaxy; piezoresistive strain gauges; temperature sensors; Actuators; Atomic layer deposition; Design optimization; Electrothermal effects; Epitaxial growth; Manufacturing; Process design; Scanning probe microscopy; Semiconductor process modeling; Testing; CMOS-MEMS; Cantilever; Closed-loop control; Electrothermal actuator; Scanning probe microscope;
Conference_Titel :
Microsystems and Nanoelectronics Research Conference, 2008. MNRC 2008. 1st
Conference_Location :
Ottawa, Ont.
Print_ISBN :
978-1-4244-2920-2
Electronic_ISBN :
978-1-4244-2921-9
DOI :
10.1109/MNRC.2008.4683382
