DocumentCode :
481284
Title :
Cross-coupling control for synchronized scan of experimental wafer and reticle stage
Author :
Wang, Chunhong ; Yin, Wensheng ; Duan, Guanghong
Author_Institution :
Dept. of Precision Instruments and Mechanology, Tsinghua University, Beijing, 100084, China
fYear :
2006
fDate :
6-7 Nov. 2006
Firstpage :
1168
Lastpage :
1172
Abstract :
In the step & scan lithography system, the wafer stage and reticle stage should scan simultaneously at a high speed and the speed ratio is 1:4. The synchronization between the two stages has significant effect on the quality of exposure. The wafer stage is four times heavier than the wafer stage and the response speeds are different, which adds difficulty to the synchronization control system. After the construction of each stage motion control system, two kinds of synchronization control methods are applied. The first one is parallel mode, where both of the stages track on the command as accurate as possible. The second one is cross-coupling control, where one of the stages can get the information on the other one and compensate the following error. Because the response speed of reticle stage is faster than that of the wafer stage, the wafer stage’s following error is feedback to the reticle stage’s controller. Two kinds of synchronization methods are compared. Experiment shows that the cross-coupling controller can much increase the synchronization performance of the two stages.
Keywords :
Cross-coupling; motion control; synchronized scan;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Technology and Innovation Conference, 2006. ITIC 2006. International
Conference_Location :
Hangzhou
ISSN :
0537-9989
Print_ISBN :
0-86341-696-9
Type :
conf
Filename :
4752176
Link To Document :
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