DocumentCode :
48232
Title :
Thermal Management of Hybrid Silicon Ring Lasers for High Temperature Operation
Author :
Chong Zhang ; Di Liang ; Kurczveil, Geza ; Bowers, John E. ; Beausoleil, Raymond G.
Author_Institution :
Syst. Res. Lab., Hewlett-Packard Labs., Palo Alto, CA, USA
Volume :
21
Issue :
6
fYear :
2015
fDate :
Nov.-Dec. 2015
Firstpage :
1
Lastpage :
7
Abstract :
We discuss the thermal management of microring lasers on hybrid silicon platform in order to optimize their high-temperature lasing performance. The thermal impedance of microring lasers was improved with a novel thermal shunt design. We report a significant improvement of hybrid silicon microring laser performance, with the maximum continuous wave lasing stage temperature up to 105 °C.
Keywords :
elemental semiconductors; micro-optics; quantum well lasers; ring lasers; silicon; Si; continuous wave lasing stage temperature; high-temperature lasing performance; hybrid silicon microring laser performance; hybrid silicon platform; thermal impedance; thermal management; thermal shunt design; Heating; Metals; Resistance; Ring lasers; Silicon; Substrates; Quantum well lasers; Ring lasers; Silicon photonics; Thermal management; ring lasers; silicon photonics; thermal management;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2015.2428057
Filename :
7097634
Link To Document :
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