Title :
Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas
Author :
Young-cheol Kim ; Hyo-Chang Lee ; Chin-Wook Chung
Author_Institution :
Dept. of Nanoscale Semicond. Eng., Hanyang Univ., Seoul, South Korea
Abstract :
In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with changing rf power and gas pressure. As the ICP power increases at a fixed argon gas pressure of 100 mtorr, increase in the plasma density is observed at the radial edge. It could be understood by the neutral gas depletion in the discharge center and the step-ionization effect.
Keywords :
argon; high-frequency discharges; ionisation; plasma boundary layers; plasma density; plasma diagnostics; 2-D measurement method; 2-D plasma density profile; Ar; ICP power; argon inductively coupled plasmas; discharge center; fixed argon gas pressure; neutral gas depletion; plasma uniformity; pressure 100 mtorr; radial edge; rf power; step-ionization effect; Density measurement; Iterative closest point algorithm; Plasma density; Plasma measurements; Pressure measurement; Semiconductor device measurement; ICP; neutral gas depletion; plasma uniformity;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2331362
