DocumentCode :
4826
Title :
Rejection of Aliased Disturbances in a Production Pulsed Light Source
Author :
Riggs, D.J. ; Bitmead, Robert
Author_Institution :
Cymer, Inc., San Diego, CA, USA
Volume :
21
Issue :
2
fYear :
2013
fDate :
Mar-13
Firstpage :
480
Lastpage :
488
Abstract :
We study a disturbance rejection problem in a production pulsed light source, used in semiconductor photolithography, to yield quantifiable and guaranteed improved performance over existing control techniques. The disturbances of interest include an offset with reset properties and sinusoids which appear aliased in the measured data which is available only at pulse events. The light source is pulsed at varying rates yet actuators move in continuous-time, yielding a system which blends aspects of continuous-time and variable-data-rate discrete-time. We employ novel modifications to standard continuous-discrete Kalman filtering ideas for disturbance state estimation and establish and solve a non-standard regularized minimum variance control problem within a disturbance rejection framework. The controller as discussed is now in production in semiconductor lithography manufacturing lines. We analyze data from these production light sources and show the controller has the capacity to remove aliased sinusoids from the measured output and yields operational performance levels provably close to optimal for the hardware.
Keywords :
Kalman filters; actuators; continuous time systems; data analysis; discrete time systems; light sources; photolithography; semiconductor industry; state estimation; aliased disturbance rejection; aliased sinusoid production; aliased sinusoid removal; continuous-discrete Kalman filltering; disturbance state estimation; light sources; nonstandard regularized minimum variance control problem; production pulsed light source; semiconductor lithography manufacturing lines; semiconductor phototolithography; Actuators; Delay; Light sources; Production; Pulse measurements; Control performance monitoring; disturbance rejection; multi-rate control; performance limitations; photolithography; sampled-data control;
fLanguage :
English
Journal_Title :
Control Systems Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
1063-6536
Type :
jour
DOI :
10.1109/TCST.2012.2186573
Filename :
6156488
Link To Document :
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