• DocumentCode
    48550
  • Title

    Subthreshold Electron Transport Properties of Ultrascaled Phase Change Memory

  • Author

    Jie Liu ; Xu Xu ; Anantram, Manjeri P.

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Washington, Seattle, WA, USA
  • Volume
    35
  • Issue
    5
  • fYear
    2014
  • fDate
    May-14
  • Firstpage
    533
  • Lastpage
    535
  • Abstract
    This letter investigates the subthreshold electron transport properties of ultrascaled phase change material (PCM) GeTe, which is sandwiched by TiN electrodes, by using ab initio molecular dynamics, density functional theory, and Green´s function. Our purely ab initio simulations reproduce the measured current-voltage curve characteristics of crystalline (c-) and amorphous (a-) PCM. The ON/OFF ratio and the underlying electron transport mechanism are explained. The electron transport properties of ultrascaled c-PCM are dominated by metal-induced gap states, and the measured linear and exponential shapes of the subthreshold current-voltage curve of ultrascaled a-PCM are a consequence of both the bias window enlarging and the biasinduced change of transmission.
  • Keywords
    Green´s function methods; ab initio calculations; density functional theory; electrochemical electrodes; electron transport theory; germanium compounds; molecular dynamics method; phase change memories; titanium compounds; Green function; ON-OFF ratio; TiN-GeTe-TiN; ab initio molecular dynamics; amorphous PCM; crystalline PCM; density functional theory; electrode; electron transport mechanism; exponential shape measurement; linear shape measurement; metal-induced gap state; subthreshold current-voltage curve characteristics; subthreshold electron transport property; ultrascaled phase change memory; Current measurement; Phase change materials; Phase change memory; Photonic band gap; Scattering; Shape; Switches; $ab~initio$ molecular dynamics; Green´s function; Green´s function.; Phase change memory; ab initio molecular dynamics; density functional theory; device scaling;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2014.2311461
  • Filename
    6777521