DocumentCode :
48593
Title :
Bevel Junction Termination Extension—A New Edge Termination Technique for 4H-SiC High-Voltage Devices
Author :
Woongje Sung ; Huang, Alex Q. ; Baliga, B. Jayant
Author_Institution :
Future Renewable Electr. Energy Delivery & Manage. Syst. Center, North Carolina State Univ., Raleigh, NC, USA
Volume :
36
Issue :
6
fYear :
2015
fDate :
Jun-15
Firstpage :
594
Lastpage :
596
Abstract :
A new edge termination method, referred to as a bevel junction termination extension (Bevel-JTE), is presented for high-voltage silicon carbide devices. The 4H-SiC PiN rectifiers, with a breakdown voltage of 1600 V (~95% of the theoretical value), were fabricated using Bevel-JTEs. The Bevel-JTE technique significantly reduces the chip size by decreasing space occupied by edge termination while providing broad process latitude for parameter variations, such as implantation dose and activation anneal condition.
Keywords :
annealing; p-i-n diodes; rectifiers; semiconductor device breakdown; silicon compounds; wide band gap semiconductors; 4H-SiC PiN rectifiers; 4H-SiC high-voltage devices; SiC; activation anneal condition; bevel junction termination extension; breakdown voltage; broad process latitude; edge termination; high-voltage silicon carbide devices; implantation dose; parameter variations; voltage 1600 V; Annealing; Blades; Implants; Junctions; Leakage currents; Silicon carbide; Voltage measurement; 4H-SiC; Bevel Dicing; Edge Termination; Edge termination; PiN diode; bevel dicing; junction termination extension (JTE);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2015.2427654
Filename :
7097678
Link To Document :
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