DocumentCode :
48708
Title :
Analysis of Carrier Transport in Short-Channel MOSFETs
Author :
Majumdar, Angshul ; Antoniadis, Dimitri A.
Author_Institution :
Res. Div., T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
Volume :
61
Issue :
2
fYear :
2014
fDate :
Feb. 2014
Firstpage :
351
Lastpage :
358
Abstract :
A method for extracting transport parameters in short-channel FETs is presented in the context of the Lundstrom model for quasi-ballistic short-channel FETs. The parameters extracted from measured data are unidirectional thermal velocity, critical length, and mean free path at low and high drain biases. The method is based on an analysis of the channel length dependence of apparent mobility and virtual-source (VS) velocity, which are obtained by fitting the VS model to measured data. Data from (100)-oriented undoped-body extremely thin silicon-on-insulator FETs with neutral stress liners are used to validate the method. Since this method does not assume any theoretical knowledge of band structure parameters, it can be applied to short-channel FETs with any geometry, any channel material, and with unknown levels of channel stress.
Keywords :
MOSFET; band structure; carrier mobility; semiconductor device models; silicon-on-insulator; (100)-oriented undoped-body; Lundstrom model; Si; apparent mobility; band structure parameters; carrier transport; channel length dependence; critical length; mean free path; quasiballistic short-channel FET; short-channel MOSFET; silicon-on-insulator; transport parameters; unidirectional thermal velocity; virtual-source velocity; Analytical models; Data models; Logic gates; MOSFET; Mathematical model; Stress; HEMTs; MOSFETs; quasi-ballistic transport;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2294380
Filename :
6702447
Link To Document :
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