DocumentCode
4891
Title
Back-Contacted Silicon Heterojunction Solar Cells With Efficiency >21%
Author
Tomasi, Andrea ; Paviet-Salomon, Bertrand ; Lachenal, Damien ; Martin de Nicolas, Silvia ; Descoeudres, A. ; Geissbuhler, Jonas ; De Wolf, Stefaan ; Ballif, Christophe
Author_Institution
Photovoltaics & Thin-Film Electron. Lab., Ecole Polytech. Fed. de Lausanne, Neuchâtel, Switzerland
Volume
4
Issue
4
fYear
2014
fDate
Jul-14
Firstpage
1046
Lastpage
1054
Abstract
We report on the fabrication of back-contacted silicon heterojunction solar cells with conversion efficiencies above 21%. Our process technology relies solely on simple and size-scalable patterning methods, with no high-temperature steps. Using in situ shadow masks, doped hydrogenated amorphous silicon layers are patterned into two interdigitated combs. Transparent conductive oxide and metal layers, forming the back electrodes, are patterned by hot melt inkjet printing. With this process, we obtain high short-circuit current densities close to 40 mA/cm2 and open-circuit voltages exceeding 720 mV, leading to a conversion efficiency of 21.5%. However, moderate fill factor values limit our current device efficiencies. Unhindered carrier transport through both heterocontact layer stacks, as well as higher passivation quality over the minority carrier-injection range relevant for solar cell operation, are identified as key factors for improved fill factor values and device performance.
Keywords
amorphous semiconductors; current density; elemental semiconductors; hydrogen; ink jet printing; minority carriers; semiconductor heterojunctions; silicon; solar cells; Si:H; back electrodes; back-contacted silicon heterojunction solar cells; carrier transport; conversion efficiencies; doped hydrogenated amorphous silicon layers; heterocontact layer stacks; hot melt inkjet printing; interdigitated combs; metal layer; minority carrier-injection; moderate fill factor; open-circuit voltages; passivation quality; shadow masks; short-circuit current densities; size-scalable patterning methods; transparent conductive oxide layer; Computer architecture; Fabrication; Heterojunctions; Metals; Microprocessors; Photovoltaic cells; Silicon; Amorphous silicon; crystalline silicon (c-Si); heterojunctions; photovoltaic cells; solar cells;
fLanguage
English
Journal_Title
Photovoltaics, IEEE Journal of
Publisher
ieee
ISSN
2156-3381
Type
jour
DOI
10.1109/JPHOTOV.2014.2320586
Filename
6815659
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