DocumentCode :
4891
Title :
Back-Contacted Silicon Heterojunction Solar Cells With Efficiency >21%
Author :
Tomasi, Andrea ; Paviet-Salomon, Bertrand ; Lachenal, Damien ; Martin de Nicolas, Silvia ; Descoeudres, A. ; Geissbuhler, Jonas ; De Wolf, Stefaan ; Ballif, Christophe
Author_Institution :
Photovoltaics & Thin-Film Electron. Lab., Ecole Polytech. Fed. de Lausanne, Neuchâtel, Switzerland
Volume :
4
Issue :
4
fYear :
2014
fDate :
Jul-14
Firstpage :
1046
Lastpage :
1054
Abstract :
We report on the fabrication of back-contacted silicon heterojunction solar cells with conversion efficiencies above 21%. Our process technology relies solely on simple and size-scalable patterning methods, with no high-temperature steps. Using in situ shadow masks, doped hydrogenated amorphous silicon layers are patterned into two interdigitated combs. Transparent conductive oxide and metal layers, forming the back electrodes, are patterned by hot melt inkjet printing. With this process, we obtain high short-circuit current densities close to 40 mA/cm2 and open-circuit voltages exceeding 720 mV, leading to a conversion efficiency of 21.5%. However, moderate fill factor values limit our current device efficiencies. Unhindered carrier transport through both heterocontact layer stacks, as well as higher passivation quality over the minority carrier-injection range relevant for solar cell operation, are identified as key factors for improved fill factor values and device performance.
Keywords :
amorphous semiconductors; current density; elemental semiconductors; hydrogen; ink jet printing; minority carriers; semiconductor heterojunctions; silicon; solar cells; Si:H; back electrodes; back-contacted silicon heterojunction solar cells; carrier transport; conversion efficiencies; doped hydrogenated amorphous silicon layers; heterocontact layer stacks; hot melt inkjet printing; interdigitated combs; metal layer; minority carrier-injection; moderate fill factor; open-circuit voltages; passivation quality; shadow masks; short-circuit current densities; size-scalable patterning methods; transparent conductive oxide layer; Computer architecture; Fabrication; Heterojunctions; Metals; Microprocessors; Photovoltaic cells; Silicon; Amorphous silicon; crystalline silicon (c-Si); heterojunctions; photovoltaic cells; solar cells;
fLanguage :
English
Journal_Title :
Photovoltaics, IEEE Journal of
Publisher :
ieee
ISSN :
2156-3381
Type :
jour
DOI :
10.1109/JPHOTOV.2014.2320586
Filename :
6815659
Link To Document :
بازگشت