Development of an Improved Fundamental Model for the Multiwafer LPCVD Reactor

A new fundamental model for the multiwafer LPCVD reactor has been developed. The model allows for a multicomponent mass transport description with multiple homogeneous and heterogeneous reactions. The modeled geometry includes reactor inlet and outlet sections, as well as downstream injectors. Model predictions for polysilicon deposition are compared with experimental data from two widely differing reactors. It is shown that model predictions can be improved by assuming axial and radial thermal variations within the reactor.