DocumentCode
490660
Title
Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching
Author
Elta, M. ; Etemad, H. ; Freudenberg, J.S. ; Giles, M.D. ; Grizzle, J.W. ; Kabamba, P.T. ; Khargonekar, P.P. ; Lafortune, S. ; Meerkov, S.M. ; Moyne, J.R. ; Rashap, B.A. ; Teneketzis, D. ; Terry, F.L., Jr.
Author_Institution
Solid State Electronics Laboratory, Deparment of Electrical Engineering and Computer Science, The university of Michigan, Ann Arbor, MI 48109-2122.
fYear
1993
fDate
2-4 June 1993
Firstpage
2990
Lastpage
2997
Abstract
This paper describes the development of real-time control technology for the improvement of manufacturing characteristics of reactive ion etchers. A general control strategy is presented as well as supporting experimental results.
Keywords
Control systems; Etching; Feedback control; Laboratories; Manufacturing processes; Plasma applications; Plasma materials processing; Production facilities; Pulp manufacturing; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 1993
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-0860-3
Type
conf
Filename
4793451
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