DocumentCode
491456
Title
Voltage Compliant SOI MESFETs for High Linearity RF Front Ends
Author
Wilk, S. ; Balijepalli, A. ; Lepkowski, W. ; Ervin, J. ; Thornton, T.J.
Author_Institution
Center for Solid State Electron. Res., Arizona State Univ., Tempe, AZ
fYear
2008
fDate
23-25 June 2008
Firstpage
121
Lastpage
122
Abstract
With the continued scaling of ULSI CMOS, the reduction in supply voltage, VDD, represents a significant challenge to the RF design engineer. With the voltage swing of an amplifier limited to VDD/2 or less, the load presented to the drain of the transistor is chosen to be small enough to generate the necessary output power. This in turn requires that the transistor be driven with sufficient gate overdrive (Vgs - Vth) to ensure that enough current can be supplied to the load while maintaining the device in saturation. The large gate overdrive exacerbates the non-linearities that arise from the square-law behavior of the MOSFET, lD alpha (Vgs - Vth) , leading to gain compression and distortion. Although a number of elegant techniques have been developed to mitigate the distortion due to the high gate over-drive it would be useful to have a device that allowed higher voltage excursions. High voltage MOSFETs such are commonly available but often require additional process steps to be included in the CMOS flow. We have demonstrated that SOI MESFETs can be integrated alongside CMOS with no changes to the process flow. The MESFETs can tolerate high voltage excursions Gt 12V with fT and fmax in the GHz range, making them ideally suited to high linearity RF applications. Here we present measured results from a nominal 1 GHz SOI MESFET amplifier that confirm the higher linearity that can be achieved by biasing the device at lower gate over-drive.
Keywords
CMOS integrated circuits; MESFET integrated circuits; ULSI; silicon-on-insulator; MOSFET; RF front ends; SOI MESFET; ULSI CMOS; gain compression; gain distortion; voltage compliant device; CMOS process; Linearity; MESFETs; MOSFETs; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Ultra large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 2008
Conference_Location
Santa Barbara, CA
ISSN
1548-3770
Print_ISBN
978-1-4244-1942-5
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2008.4800764
Filename
4800764
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