• DocumentCode
    493348
  • Title

    3D integration technologies

  • Author

    Ramm, Peter ; Klumpp, Armin ; Weber, Josef ; Taklo, Maaike M V

  • Author_Institution
    Munich Div., Fraunhofer Inst. for Reliability & Microintegration, Munich
  • fYear
    2009
  • fDate
    1-3 April 2009
  • Firstpage
    71
  • Lastpage
    73
  • Abstract
    3D integration is a key solution to the predicted performance problems of future ICs as well as it offers extreme miniaturization and cost-effective fabrication of More than Moore products (e.g. e-CUBESreg). Through silicon via (TSV) technologies enable high interconnect performance at relatively high fabrication cost compared to 3D packaging. A post backend-of-line TSV process is introduced as optimized technology for More than Moore products: The ICV-SLID process enables 3D integration of completely fabricated devices. Reliability issues, as thermo-mechanical stress caused by TSV formation and bonding are considered. The technology choice for the e-CUBES automotive application demonstrator is described.
  • Keywords
    integrated circuit bonding; integrated circuit reliability; silicon; thermomechanical treatment; 3D integration technology; ICV-SLID process; bonding; e-CUBES automotive application demonstrator; interconnect performance; post backend-of-line TSV process; reliability; thermo-mechanical stress; through-silicon-via technology; Costs; Delay; Dielectrics; Fabrication; Lithography; Packaging; Silicon; Stacking; Through-silicon vias; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design, Test, Integration & Packaging of MEMS/MOEMS, 2009. MEMS/MOEMS '09. Symposium on
  • Conference_Location
    Rome
  • Print_ISBN
    978-1-4244-3874-7
  • Type

    conf

  • Filename
    4919553