DocumentCode :
494214
Title :
79GHz integrated antenna on low resistivity Si BiCMOS exploiting above-IC processing
Author :
Pinto, Y. ; Person, C. ; Gloria, D. ; Cathelin, A. ; Belot, D. ; Pruvost, S. ; Plana, R.
Author_Institution :
Lab.-STICC, TELECOM Bretagne, Brest
fYear :
2009
fDate :
23-27 March 2009
Firstpage :
3539
Lastpage :
3543
Abstract :
This paper analyses the antenna implementation on BiCMOS technology. A dipole antenna, working at 79 GHz, is implemented and manufactured. The radiation simulated results reveal low gain (-6.8 dBi with IE3D and -8.5 with FEKO) and low radiation efficiency (8.9% with IE3D, 10.39% with FEKO), as expected. Classical techniques to optimise these performances require complex fabrication process. An alternative solution based on ldquomaskingrdquo technique is presented offering low cost and good performance advantages. In this way, +2.65 dBi of gain and 37% of radiation efficiency are obtained with an antenna implemented on BiCMOS technology with post-IC processing.
Keywords :
BiCMOS integrated circuits; antenna radiation patterns; dipole antennas; elemental semiconductors; millimetre wave antennas; silicon; Si; complex fabrication process; dipole antenna; frequency 79 GHz; integrated antenna; integrated circuit processing; low radiation efficiency; low resistivity BiCMOS; masking technique; post-IC processing; BiCMOS integrated circuits; Conductivity; Dielectric substrates; Frequency; Loaded antennas; Microstrip antennas; Prototypes; Testing; Ultra wideband antennas; Ultra wideband technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Antennas and Propagation, 2009. EuCAP 2009. 3rd European Conference on
Conference_Location :
Berlin
Print_ISBN :
978-1-4244-4753-4
Electronic_ISBN :
978-3-00-024573-2
Type :
conf
Filename :
5068358
Link To Document :
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