• DocumentCode
    49683
  • Title

    Ultrathin NbTiN Films With High Ti Composition for Superconducting Nanowire Single Photon Detectors

  • Author

    Jia, X.Q. ; Kang, L. ; Yang, X.Z. ; Wang, Z.H. ; Ren, T.K. ; Jin, B.B. ; Chen, Jiann-Jong ; Xu, W.W. ; Wu, P.H.

  • Author_Institution
    Res. Inst. of Supercond. Electron. (RISE), Nanjing Univ., Nanjing, China
  • Volume
    25
  • Issue
    3
  • fYear
    2015
  • fDate
    Jun-15
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We have fabricated and characterized ultrathin NbTiN films with high Titanium (Ti) composition for applications of superconducting nanowire single photon detectors (SNSPD). An alloy with 47 wt. % Ti and 53 wt. % Nb as the target material is employed. NbTiN thin films with thicknesses ranging from 5 nm to 20 nm are grown onto MgO (100), Si (100) and SiOX-Si substrates by DC magnetron sputtering. The zero resistance superconducting transition temperature (TC0) of about 8.8 K has been obtained for the NbTiN film of 8 nm thick on MgO substrate. With twice Ti composition than usual NbTiN film, the lattice mismatch and low resistivity are further improved, which will be more favorable for the performance of SNSPD. The results of the films´ structural characterizations by AES, AFM, TEM and XRD are also presented.
  • Keywords
    Auger electron spectra; X-ray diffraction; atomic force microscopy; electrical resistivity; nanosensors; nanowires; niobium compounds; sputter deposition; superconducting photodetectors; superconducting thin films; superconducting transition temperature; thin film sensors; titanium compounds; transmission electron microscopy; AES; AFM; DC magnetron sputtering; MgO; MgO(100) substrates; NbTiN; SNSPD; Si; Si(100) substrates; SiOX-Si; SiOX-Si substrates; TEM; XRD; lattice mismatch; size 5 nm to 20 nm; structural characterization; superconducting nanowire single photon detectors; titanium composition; ultrathin films; zero resistance superconducting transition temperature; Detectors; Films; Lattices; Photonics; Silicon; Substrates; Superconducting transition temperature; Magnetron sputtering; Niobium nitride; Niobium titanium nitride; magnetron sputtering; niobium nitride; superconducting ultra-thin film;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/TASC.2014.2373818
  • Filename
    6963351