Title :
Highly scalable Z-RAM with remarkably long data retention for DRAM application
Author :
Jang, Tae-Su ; Joong-Sik Kim ; Hwang, Sang-Min ; Oh, Young-Hoon ; Rho, Kwang-Myung ; Chung, Seoung-Ju ; Chung, Su-Ock ; Oh, Jae-Geun ; Bhardwaj, Sunil ; Kwon, Jungtae ; Kim, Yong-Taik ; Nagoga, Mikhail ; Yong-Taik Kim ; Cha, Seon-Yong ; Moon, Seung-Chan ;
Author_Institution :
R&D Div., Hynix Semicond. Inc., Icheon, South Korea
Abstract :
The operating characteristics and retention times of floating body cells and arrays using Z-RAMreg technology fabricated on a 50 nm DRAM process are presented. For the first time, data retention time longer than 8 s at 93degC and 1.6 V wide programming window are obtained on floating body cells as small as 54 nm times 54 nm. These results demonstrate the suitability of floating body memories for DRAM applications. These improvements were obtained through optimization of DRAM technology such as junction engineering, thermal treatments, and improved passivation processes.
Keywords :
DRAM chips; semiconductor technology; DRAM application; Z-RAM; floating body cell; long data retention; size 54 nm; temperature 93 C; voltage 1.6 V; Costs; Degradation; Manufacturing; Moon; Passivation; Random access memory; Research and development; Silicon; Thermal engineering; Voltage;
Conference_Titel :
VLSI Technology, 2009 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-3308-7