DocumentCode :
497198
Title :
Process-design considerations for three dimensional memory integration
Author :
Iyer, S.S. ; Kirihata, T. ; Wordeman, M.R. ; Barth, J. ; Hannon, R.H. ; Malik, R.
Author_Institution :
Semicond. R&D Center, IBM Corp., Hopewell Junction, NY, USA
fYear :
2009
fDate :
16-18 June 2009
Firstpage :
60
Lastpage :
63
Abstract :
3D integration of memory for both memory and processor caches provide a fertile application space for 3D integration. A simple 2 strata stack can reduce individual die size by approximately half, improving chip yield. Multi chip memory stacks can ease packaging and can significantly reduce power for main memory. Such stacks are easily testable and repairable through redundancy The design of such 3D stacks is critically dependent on the TSV technology used and is expected to become more attractive as TSV diameters and TSV overhead reduce.
Keywords :
cache storage; elemental semiconductors; integrated circuit yield; microprocessor chips; redundancy; silicon; 3D memory integration; Si; chip yield; memory caches; multichip memory stacks; processor caches; redundancy; strata stack; through silicon vias; Integrated circuit interconnections; Laminates; Packaging; Power supplies; Productivity; Prototypes; Random access memory; Silicon; Space technology; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 2009 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-3308-7
Type :
conf
Filename :
5200635
Link To Document :
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