• DocumentCode
    497222
  • Title

    Gate modulation of graphene contacts - on the scaling of graphene FETs

  • Author

    Chen, Zhihong ; Appenzeller, Joerg

  • Author_Institution
    IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    2009
  • fDate
    16-18 June 2009
  • Firstpage
    128
  • Lastpage
    129
  • Abstract
    The nature of source/drain contacts in graphene field-effect transistors (GFETs) is investigated. We argue that the energy dispersion of the graphene portion underneath of the metal electrodes is substantially altered compared to its original. Moreover, different from other materials, the Fermi levels of these graphene segments are not pinned by the metal contacts, but instead can be modulated by the gate. Our experimental findings give important insights into the critical relevance of contacts for the scaling of graphene devices.
  • Keywords
    Fermi level; electrical contacts; graphene; modulation; organic field effect transistors; Fermi levels; GFET; energy dispersion; gate modulation; graphene contacts; graphene field effect transistors; metal electrodes; source/drain contacts; Charge carrier processes; Contacts; Dielectric substrates; Doping profiles; Electrodes; FETs; Gold; Nanotechnology; Photonic band gap; Voltage; FET; contacts; graphene; scaling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 2009 Symposium on
  • Conference_Location
    Honolulu, HI
  • Print_ISBN
    978-1-4244-3308-7
  • Type

    conf

  • Filename
    5200659