High aspect ratio metamaterials for enhanced tunability and sensitivity

Author

Chiam, Sher-Yi ; Bahou, Mohammed ; Moser, Herbert O. ; Gu, Jianqiang ; Singh, Ranjan ; Zhang, Weili ; Han, Jiaguang ; Bettiol, Andrew A.

Author_Institution

Dept. of Phys., Nat. Univ. of Singapore, Singapore, Singapore

fYear

2009

fDate

2-4 June 2009

Firstpage

1

Lastpage

2

Abstract

Using a proton beam based lithography process, we fabricate and study high aspect ratio metamaterials, revealing distinct 3-dimensional resonances. Increased aspect ratio also leads to enhanced tunability and sensitivity for practical applications.

Keywords

lithography; metamaterials; optical fabrication; optical materials; optical tuning; 3-dimensional resonances; high-aspect ratio metamaterial fabrication; optical sensitivity; optical tunability; proton beam-based lithography process; Dielectric substrates; Fourier transforms; Frequency; Lithography; Metamaterials; Optical device fabrication; Optical ring resonators; Particle beams; Resonance; Spectroscopy; (160.3918) Metamaterials; (220.3740) Lithography; (220.4000) Microstructure fabrication; 300.6300 Spectroscopy, Fourier transforms; 300.6495 Spectroscopy, terahertz;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on

Conference_Location

Baltimore, MD

Print_ISBN

978-1-55752-869-8

Electronic_ISBN

978-1-55752-869-8

Type

conf

Filename

5224534