DocumentCode :
499569
Title :
Porous silicon based terahertz Bragg grating filter
Author :
Lo, Shu-Zee A. ; Murphy, Thomas E.
Author_Institution :
Univ. of Maryland, College Park, MD, USA
fYear :
2009
fDate :
2-4 June 2009
Firstpage :
1
Lastpage :
2
Abstract :
We describe the fabrication and measurement of a terahertz filter based on porous silicon. The device is constructed by electrochemically etching silicon to produce a Bragg mirror comprised of alternating nanoporous silicon layers.
Keywords :
Bragg gratings; etching; optical filters; porous materials; silicon; submillimetre wave filters; Si; electrochemical etching; porous silicon; terahertz Bragg grating filter; Bragg gratings; Etching; Mirrors; Nanoporous materials; Nonhomogeneous media; Optical filters; Silicon; Submillimeter wave filters; Submillimeter wave measurements; Wavelength measurement; (160.4236) Nanomaterials; (230.1480) Bragg reflectors; (230.4170) Multilayers; (230.7408) Wavelength filtering devices; (300.6495) Spectroscopy, terahertz; (310.6628) Subwavelength structures, nanostructures;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
Type :
conf
Filename :
5224696
Link To Document :
بازگشت