Title :
Coherent imaging nano-patterning with extreme ultraviolet laser illumination
Author :
Isoyan, A. ; Jiang, F. ; Cheng, Y. ; Wachulak, P. ; Urbanski, L. ; Rocca, J. ; Menoni, C. ; Marconi, M. ; Cerrina, F.
Author_Institution :
Center for Nanotechnol., Univ. of Wisconsin-Madison, Madison, WI, USA
Abstract :
We present a high resolution extreme ultraviolet patterning approach based on Talbot self imaging and holographic projection imaging using for illumination a table top extreme ultraviolet laser.
Keywords :
Talbot effect; holography; image resolution; laser beams; nanopatterning; nanophotonics; ultraviolet lithography; Talbot self imaging; high-resolution coherent imaging; holographic projection; nanopatterning; ultraviolet laser illumination; ultraviolet lithography; Atomic force microscopy; Holographic optical components; Holography; Lighting; Lithography; Optical imaging; Optical interferometry; Optical saturation; Resists; Ultraviolet sources; 110.7440 (X-ray imaging); 340.7480 X-rays, soft x-rays, extreme ultraviolet (EUV);
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
