• DocumentCode
    499626
  • Title

    Coherent imaging nano-patterning with extreme ultraviolet laser illumination

  • Author

    Isoyan, A. ; Jiang, F. ; Cheng, Y. ; Wachulak, P. ; Urbanski, L. ; Rocca, J. ; Menoni, C. ; Marconi, M. ; Cerrina, F.

  • Author_Institution
    Center for Nanotechnol., Univ. of Wisconsin-Madison, Madison, WI, USA
  • fYear
    2009
  • fDate
    2-4 June 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We present a high resolution extreme ultraviolet patterning approach based on Talbot self imaging and holographic projection imaging using for illumination a table top extreme ultraviolet laser.
  • Keywords
    Talbot effect; holography; image resolution; laser beams; nanopatterning; nanophotonics; ultraviolet lithography; Talbot self imaging; high-resolution coherent imaging; holographic projection; nanopatterning; ultraviolet laser illumination; ultraviolet lithography; Atomic force microscopy; Holographic optical components; Holography; Lighting; Lithography; Optical imaging; Optical interferometry; Optical saturation; Resists; Ultraviolet sources; 110.7440 (X-ray imaging); 340.7480 X-rays, soft x-rays, extreme ultraviolet (EUV);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-55752-869-8
  • Electronic_ISBN
    978-1-55752-869-8
  • Type

    conf

  • Filename
    5224823
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=499626