Title :
Optical loss reduction in HIC chalcogenide glass waveguides via thermal reflow
Author :
Hu, Juejun ; Feng, Ning-Ning ; Agarwal, Anu ; Kimerling, Lionel ; Carlie, Nathan ; Petit, Laeticia ; Richardson, Kathleen
Author_Institution :
Microphotonics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA
Abstract :
A rapid thermal reflow technique is applied to high-index-contrast, sub-micron waveguides in As2S3 chalcogenide glass to reduce sidewall roughness and associated optical scattering loss. Up to 50% optical loss reduction after reflow treatment is achieved.
Keywords :
arsenic compounds; chalcogenide glasses; optical glass; optical losses; optical waveguides; rapid thermal processing; ternary semiconductors; As2S3; chalcogenide glass waveguides; high-index-contrast waveguides; optical scattering loss reduction; rapid thermal reflow treatment; sidewall roughness; sub-micron waveguides; Glass; Integrated optics; Optical devices; Optical films; Optical losses; Optical refraction; Optical scattering; Optical variables control; Optical waveguides; Temperature; (130.3120) Integrated optics devices; (160.2750) Glass and other amorphous materials; (230.7390) Waveguides, planar; (240.5770) Roughness;
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
