DocumentCode :
499838
Title :
Detection of structural defects of extremely low concentrations in commercial synthetic silica glass
Author :
Ono, M. ; Koike, A. ; Ogawa, T. ; Takata, M. ; Kikugawa, S.
Author_Institution :
Asahi Glass Co. Ltd., Yokohama, Japan
fYear :
2009
fDate :
2-4 June 2009
Firstpage :
1
Lastpage :
2
Abstract :
Concentrations of intrinsic structural defects in synthetic silica glass, AQT, were measured by highly sensitive ESR and photoluminescence measurements. It was revealed that the defects, influential for 193 nm absorption, were less than 1013 pcs/cm3.
Keywords :
flaw detection; glass structure; paramagnetic resonance; photoluminescence; silicon compounds; SiO2Jk; highly sensitive ESR; one-photon absorption; photoluminescence measurement; structural defect detection; synthetic silica glass; wavelength 193 nm; Absorption; Etching; Gas detectors; Glass; Paramagnetic resonance; Personal communication networks; Photoluminescence; Power measurement; Shape measurement; Silicon compounds; (160.2750) Glass and other amorphous materials; (160.6030) Silica;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
Type :
conf
Filename :
5225199
Link To Document :
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