• DocumentCode
    499838
  • Title

    Detection of structural defects of extremely low concentrations in commercial synthetic silica glass

  • Author

    Ono, M. ; Koike, A. ; Ogawa, T. ; Takata, M. ; Kikugawa, S.

  • Author_Institution
    Asahi Glass Co. Ltd., Yokohama, Japan
  • fYear
    2009
  • fDate
    2-4 June 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Concentrations of intrinsic structural defects in synthetic silica glass, AQT, were measured by highly sensitive ESR and photoluminescence measurements. It was revealed that the defects, influential for 193 nm absorption, were less than 1013 pcs/cm3.
  • Keywords
    flaw detection; glass structure; paramagnetic resonance; photoluminescence; silicon compounds; SiO2Jk; highly sensitive ESR; one-photon absorption; photoluminescence measurement; structural defect detection; synthetic silica glass; wavelength 193 nm; Absorption; Etching; Gas detectors; Glass; Paramagnetic resonance; Personal communication networks; Photoluminescence; Power measurement; Shape measurement; Silicon compounds; (160.2750) Glass and other amorphous materials; (160.6030) Silica;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-55752-869-8
  • Electronic_ISBN
    978-1-55752-869-8
  • Type

    conf

  • Filename
    5225199
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=499838