Title :
Low loss stoichiometric TeO2 thin films and waveguides
Author :
Vu, Khu T. ; Madden, Steve J. ; Luther-Davies, Barry
Author_Institution :
Laser Phys. Centre, Australian Nat. Univ., Canberra, ACT, Australia
Abstract :
Stoichiometric low loss Tellurium dioxide, TeO2, films have been produced by reactive magnetron RF sputtering. Long rib waveguides with very low loss are fabricated using reactive ion etching techniques. As-deposited TeO2 films and waveguides with propagation loss around or below 0.1 dB/cm at 1550 nm have been achieved.
Keywords :
optical films; optical losses; optical waveguides; sputter etching; stoichiometry; tellurium compounds; TeO2; long rib waveguides; optical waveguides; propagation loss; reactive ion etching; reactive magnetron RF sputtering; stoichiometric low loss; tellurium dioxide thin films; wavelength 1550 nm; Glass; Nonlinear optics; Optical films; Optical losses; Optical refraction; Optical waveguides; Radio frequency; Silicon compounds; Sputtering; Tellurium; (310.1860) Deposition and fabrication; (310.6860) Thin films, optical properties;
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
