Parallel direct-write nanolithography using arrays of optically trapped microlenses

Author

McLeod, Euan ; Arnold, Craig B.

Author_Institution

Mech. & Aerosp. Eng., Princeton Univ., Princeton, NJ, USA

fYear

2009

fDate

2-4 June 2009

Firstpage

1

Lastpage

2

Abstract

We use Bessel beam optical traps to self-position arrays of microsphere objectives near surfaces. Pulsed laser illumination of these objectives is used to perform near-field direct-write subwavelength optical nanopatterning with 100 nm feature sizes.

Keywords

laser beams; laser materials processing; microlenses; nanolithography; nanopatterning; nanophotonics; optical arrays; optical fabrication; radiation pressure; Bessel beam; array self-positioning; direct-write optical nanopatterning; microlens arrays; microsphere objectives; near-field optical nanopatterning; optical traps; optically trapped microlenses; parallel direct-write nanolithography; pulsed laser illumination; subwavelength optical nanopatterning; Charge carrier processes; Laser beams; Lenses; Lighting; Microoptics; Nanolithography; Nanopatterning; Optical arrays; Optical beams; Optical pulses; (350.3390) Laser materials processing; (350.4855) Optical tweezers or optical manipulation;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on

Conference_Location

Baltimore, MD

Print_ISBN

978-1-55752-869-8

Electronic_ISBN

978-1-55752-869-8

Type

conf

Filename

5226017