DocumentCode :
503442
Title :
Nanotechnology of Mn4Si7 epitaxial film formation on monocryctalline silicon
Author :
Makogon, Yu.N. ; Pavlova, E.P. ; Sidorenko, S.I. ; Beddies, G.
Author_Institution :
Nat. Tech. Univ. of Ukraine KPI, Kiev, Ukraine
fYear :
2009
fDate :
14-18 Sept. 2009
Firstpage :
615
Lastpage :
616
Abstract :
This research is devoted to the study of the formation regularities of the Mn4Si7 epitaxial films mediated surfactant Sb in the Mn(25 nm)/Sb(0,2...1 ML)/buffer Si(100 nm)/Si(001) nanodimensional film composition (NFC).
Keywords :
epitaxial layers; manganese alloys; nanofabrication; silicon alloys; surfactants; Mn4Si7-Si; Si; epitaxial film formation; monocrystalline silicon; nanotechnology; Chemical technology; Helium; Nanotechnology; Physics; Semiconductor films; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave & Telecommunication Technology, 2009. CriMiCo 2009. 19th International Crimean Conference
Conference_Location :
Sevastopol
Print_ISBN :
978-1-4244-4796-1
Type :
conf
Filename :
5292957
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=503442
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