Title :
Structure of films obtained as the result of oxidation and thermal treatment of nanostructured polycrystalline silicon doped by germanium
Author :
Kovalevsky, A.A. ; Strogova, A.S. ; Plyakin, D.V.
Author_Institution :
Belarusian State Univ. of Inf. & Radioelectron., Minsk, Belarus
Abstract :
The process of formation and properties of germanosilicate glass (GSG) films in the process of oxidation of nanostructured polycrystalline silicon doped by germanium films is investigated.
Keywords :
dielectric thin films; germanate glasses; germanium; heat treatment; nanostructured materials; oxidation; silicon; GeSiOJk; Si:Ge; germanium; germanosilicate glass films; nanostructured polycrystalline silicon; oxidation; thermal treatment; Electromagnetic wave absorption; Germanium; Helium; IEEE catalog; Organizing; Oxidation; Positron emission tomography; Semiconductor films; Silicon;
Conference_Titel :
Microwave & Telecommunication Technology, 2009. CriMiCo 2009. 19th International Crimean Conference
Conference_Location :
Sevastopol
Print_ISBN :
978-1-4244-4796-1
