DocumentCode :
503804
Title :
A model for the critical voltage for electrical degradation of GaN high electron mobility transistors
Author :
Joh, Jungwoo ; Gao, Feng ; Palacios, Tomás ; del Alamo, Jesús A.
Author_Institution :
Massachusetts Inst. of Technol., Cambridge, MA, USA
fYear :
2009
fDate :
11-11 Oct. 2009
Firstpage :
3
Lastpage :
6
Abstract :
It has recently been postulated that GaN high electron mobility transistors under high voltage stress degrade as a result of defect formation induced by excessive mechanical stress that is introduced through the inverse piezoelectric effect. This mechanism is characterized by a critical voltage beyond which irreversible degradation takes place. We have built a first-order model for the critical voltage for degradation of GaN HEMTs. In our model, electrical degradation occurs when the elastic energy stored in the AlGaN barrier exceeds a critical value. When using estimations of this critical elastic energy that come from epitaxial studies of strain relaxation in Al-GaN/GaN heterostructures, our proposed model yields predictions for the critical voltage that match experimental observations.
Keywords :
gallium compounds; high electron mobility transistors; GaN; critical voltage; electrical degradation; high electron mobility transistors; inverse piezoelectric effect; Aluminum gallium nitride; Degradation; Gallium nitride; HEMTs; MODFETs; Piezoelectric effect; Semiconductor process modeling; Stress; Voltage; Yield estimation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability of Compound Semiconductors Digest (ROCS), 2009
Conference_Location :
Greensboro, NC
Print_ISBN :
978-0-7908-0124-7
Type :
conf
Filename :
5313993
Link To Document :
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