Process development for micro — nano patterning of metallic layers with applications in photonics

Author

Rebigan, R. ; Dinescu, A. ; Kusko, C. ; Comanescu, F. ; Cristea, D.

Author_Institution

Nat. Inst. for R&D in Microtechnologies (IMT-Bucharest), Bucharest, Romania

Volume

1

fYear

2009

fDate

12-14 Oct. 2009

Firstpage

193

Lastpage

196

Abstract

The paper presents the fabrication experiments for micro - nano patterning of metallic layers on silicon or dielectric substrate, using optical lithography, electron beam lithography and lift-off techniques. Both optical lithography and EBL were performed using bi-layer resist techniques, in order to obtain the ldquounder cutrdquo effect, to ease the lift-off. The fabricated micro and nano structures have applications in optoelectronics (metallic electrodes) and nanoplasmonics (metallic plasmonic waveguides and structures).

Keywords

chromium; electron beam lithography; gold; micro-optics; nanolithography; nanopatterning; nanophotonics; nanostructured materials; optical fabrication; photolithography; Cr-Au; Si; bilayer resist; dielectric substrate; electron beam lithography; lift-off techniques; metallic electrodes; metallic layers; metallic plasmonic waveguides; micropatterning; nanopatterning; nanoplasmonics; optical lithography; optoelectronics; photonics; silicon substrate; undercut effect; Dielectric substrates; Electron beams; Electron optics; Lithography; Optical beams; Optical device fabrication; Optical waveguides; Photonics; Resists; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2009. CAS 2009. International

Conference_Location

Sinaia

ISSN

1545-827X

Print_ISBN

978-1-4244-4413-7

Type

conf

DOI

10.1109/SMICND.2009.5336573

Filename

5336573