Title :
CMOS temperature sensors based on thermal diffusion
Author :
Van Vroonhoven, Caspar ; Kashmiri, Mahdi ; Makinwa, Kofi
Author_Institution :
Electron. Instrum. Lab., Delft Univ. of Technol., Delft, Netherlands
Abstract :
This work presents an overview of recent research into integrated temperature sensors based on thermal diffusivity sensing. Such sensors make use of the fact that the thermal diffusivity of highly pure IC-grade silicon has a well-defined temperature dependence and is insensitive to process spread. To measure thermal diffusivity, an on-chip thermal delay can be defined and then used to define the frequency of a VCO. Alternatively, this delay can be directly digitized. Several proof-of-concept devices fabricated in 0.7mum CMOS technology demonstrate good accuracy and reproducibility. They achieve untrimmed inaccuracies in the order of plusmn0.6degC (3sigma) over the military temperature range (-55degC to 125degC), based on the measured performance of 16 samples per batch.
Keywords :
CMOS integrated circuits; elemental semiconductors; silicon; temperature sensors; thermal diffusion; thermal diffusivity; CMOS technology; CMOS temperature sensors; IC-grade silicon; integrated temperature sensors; military temperature; on-chip thermal delay; proof-of-concept devices; size 0.7 mum; temperature -55 degC to 125 degC; thermal diffusion; thermal diffusivity sensing; well-defined temperature; CMOS technology; Delay; Frequency measurement; Reproducibility of results; Silicon; Temperature dependence; Temperature distribution; Temperature sensors; Thermal sensors; Voltage-controlled oscillators;
Conference_Titel :
Thermal Investigations of ICs and Systems, 2009. THERMINIC 2009. 15th International Workshop on
Conference_Location :
Leuven
Print_ISBN :
978-1-4244-5881-3