• DocumentCode
    505507
  • Title

    Spatial and temporal temperature variations in CMOS designs

  • Author

    Janssen, J.H.J. ; Veendrick, H.J.M.

  • Author_Institution
    NXP Semicond., Nijmegen, Netherlands
  • fYear
    2009
  • fDate
    7-9 Oct. 2009
  • Firstpage
    31
  • Lastpage
    35
  • Abstract
    Due to the rapid growth in the number of transistors per chip, the power consumption of the average nMOS ASIC reached the level of one Watt, which is, in order of magnitude, about the maximum power consumption allowed for a cheap plastic package without thermal enhancements like drop-in heat spreader, fused leads or exposed pads. The internal chip temperature is the result of the combination of the chip power, the package, a possible heatsink, the application board and the airflow conditions. This requires a reasonably accurate model that includes the thermal properties of the chip, the bonds, the package and the system.
  • Keywords
    CMOS integrated circuits; integrated circuit design; power consumption; CMOS designs; internal chip temperature; power consumption; spatial and temporal temperature variations; CMOS technology; Energy consumption; Integrated circuit packaging; Integrated circuit technology; Land surface temperature; Logic circuits; Logic gates; MOS devices; Stress; Temperature distribution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermal Investigations of ICs and Systems, 2009. THERMINIC 2009. 15th International Workshop on
  • Conference_Location
    Leuven
  • Print_ISBN
    978-1-4244-5881-3
  • Type

    conf

  • Filename
    5340084