DocumentCode :
505764
Title :
Optimization of nanoscale silicon waveguide fabrication
Author :
Chen, Yao ; Junbo Feng ; Zhou, Zhiping ; Yu, Jun ; Summers, Christopher J. ; Citrin, David S.
Author_Institution :
Wuhan Nat. Lab. for Optoelectron., Huazhong Univ. of Sci. & Technol., Wuhan, China
fYear :
2008
fDate :
Oct. 30 2008-Nov. 2 2008
Firstpage :
1
Lastpage :
3
Abstract :
A simple and effective technique was developed to improve the nanoscale silicon waveguide fabrication. 40 nanometer features with smooth and vertical sidewall are demonstrated. With this technique, nanoscale silicon grating coupler was obtained.
Keywords :
diffraction gratings; nanofabrication; nanophotonics; optical couplers; optical fabrication; silicon; Si; nanoscale silicon grating coupler; optimised nanoscale silicon waveguide fabrication; size 40 nm; Coils; Etching; Gratings; Lithography; Nanoscale devices; Optical device fabrication; Optical modulation; Optical waveguides; Plasma applications; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fiber Communication & Optoelectronic Exposition & Conference, 2008. AOE 2008. Asia
Conference_Location :
Shanghai
Print_ISBN :
978-1-55752-863-6
Electronic_ISBN :
978-1-55752-863-6
Type :
conf
Filename :
5348590
Link To Document :
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