• DocumentCode
    505764
  • Title

    Optimization of nanoscale silicon waveguide fabrication

  • Author

    Chen, Yao ; Junbo Feng ; Zhou, Zhiping ; Yu, Jun ; Summers, Christopher J. ; Citrin, David S.

  • Author_Institution
    Wuhan Nat. Lab. for Optoelectron., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • fYear
    2008
  • fDate
    Oct. 30 2008-Nov. 2 2008
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    A simple and effective technique was developed to improve the nanoscale silicon waveguide fabrication. 40 nanometer features with smooth and vertical sidewall are demonstrated. With this technique, nanoscale silicon grating coupler was obtained.
  • Keywords
    diffraction gratings; nanofabrication; nanophotonics; optical couplers; optical fabrication; silicon; Si; nanoscale silicon grating coupler; optimised nanoscale silicon waveguide fabrication; size 40 nm; Coils; Etching; Gratings; Lithography; Nanoscale devices; Optical device fabrication; Optical modulation; Optical waveguides; Plasma applications; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communication & Optoelectronic Exposition & Conference, 2008. AOE 2008. Asia
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-55752-863-6
  • Electronic_ISBN
    978-1-55752-863-6
  • Type

    conf

  • Filename
    5348590
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=505764