Title :
Etched Diffraction Grating demultiplexers based on amorphous silicon nanowire platform
Author :
Zhu, Ning ; Song, Jun ; Wosinski, Lech ; He, Sailing
Author_Institution :
Dept. of Microelectron. & Appl. Phys., R. Inst. of Technol. (KTH), Kista, Sweden
fDate :
Oct. 30 2008-Nov. 2 2008
Abstract :
We present some theoretical and experimental results of etched diffraction grating demultiplexer based on amorphous silicon nanowire platform, including issues with polarization sensitivity, diffraction efficiency and an application to triplexer.
Keywords :
amorphous semiconductors; demultiplexing equipment; diffraction gratings; elemental semiconductors; etching; light polarisation; nanophotonics; nanowires; optical fabrication; optical materials; silicon; Si; amorphous silicon nanowire platform; diffraction efficiency; etched diffraction grating demultiplexer; polarization sensitivity; triplexer; Amorphous silicon; Arrayed waveguide gratings; Diffraction gratings; Etching; Helium; Nanoscale devices; Optical devices; Optical diffraction; Optical polarization; Refractive index;
Conference_Titel :
Optical Fiber Communication & Optoelectronic Exposition & Conference, 2008. AOE 2008. Asia
Conference_Location :
Shanghai
Print_ISBN :
978-1-55752-863-6
Electronic_ISBN :
978-1-55752-863-6
