Title :
An ultra-compact polarization insensitive directional coupler
Author :
Shi, Y. ; Anand, S. ; He, S.
Author_Institution :
Joint Res. Center of Photonics, R. Inst. of Technol., Stockholm, Sweden
fDate :
Oct. 30 2008-Nov. 2 2008
Abstract :
We investigate the lag-effect in the dry etching process. In one etch step, asymmetric waveguides with a shallow groove in between can be fabricated. This special property can be utilized for the design of an ultra-compact polarization insensitive directional coupler.
Keywords :
light polarisation; optical design techniques; optical directional couplers; optical fabrication; sputter etching; ICP-RIE dry etching process; lag-effect; photonic integrated circuits; shallow groove; ultra-compact polarization insensitive directional coupler design; Directional couplers; Dry etching; Epitaxial growth; Indium phosphide; Optical materials; Optical modulation; Optical polarization; Optical waveguides; Scanning electron microscopy; Waveguide discontinuities;
Conference_Titel :
Optical Fiber Communication & Optoelectronic Exposition & Conference, 2008. AOE 2008. Asia
Conference_Location :
Shanghai
Print_ISBN :
978-1-55752-863-6
Electronic_ISBN :
978-1-55752-863-6
