• DocumentCode
    507443
  • Title

    An efficient algorithm for modeling spatially-correlated process variation in statistical full-chip leakage analysis

  • Author

    Ye, Zuochang ; Yu, Zhiping

  • Author_Institution
    Tsinghua Univ., Beijing, China
  • fYear
    2009
  • fDate
    2-5 Nov. 2009
  • Firstpage
    295
  • Lastpage
    301
  • Abstract
    Statistical full-chip leakage analysis considering spatial correlation is highly expensive due to its O(N2) complexity for logic circuits with N gates. Although efforts have been made to reduce the cost at the loss of accuracy, existing methods are still unsuitable for large-scale problems. In this paper we resolve the problem by re-formulating the computation to one that can be done efficiently using a well-developed technique that has been widely used in fast EM simulation and machine learning areas. The resulting algorithm is provably of O(N) or O(N log N) complexity with well-defined and easily-controlled error bounds. Experiments show that using the proposed method it is feasible to handle million-gate circuits within only a few minutes on a regular desktop PC. The corresponding error is less than 0.5% compared to exhausted computation that takes more than 3 days. The proposed method is about 300× faster and 10× more accurate compared to existing grid-approximation method.
  • Keywords
    computational complexity; electrical engineering computing; integrated circuit modelling; leakage currents; O(N log N) complexity; O(N) complexity; O(N2) complexity; efficient algorithm; error bounds; logic circuits; spatially-correlated process variation; statistical full-chip leakage analysis; Algorithm design and analysis; Circuit simulation; Computational modeling; Costs; Large-scale systems; Leakage current; Logic circuits; Machine learning; Machine learning algorithms; Spatial resolution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computer-Aided Design - Digest of Technical Papers, 2009. ICCAD 2009. IEEE/ACM International Conference on
  • Conference_Location
    San Jose, CA
  • ISSN
    1092-3152
  • Print_ISBN
    978-1-60558-800-1
  • Electronic_ISBN
    1092-3152
  • Type

    conf

  • Filename
    5361278