DocumentCode :
507973
Title :
Characterization of Low Temperature Deposited Flexible Amorphous Silicon Solar Cells
Author :
Li, Yingge ; Du, Dongxing
Author_Institution :
Coll. of Autom. & Electron. Eng., Qingdao Univ. of Sci. & Technol., Qingdao, China
Volume :
1
fYear :
2009
fDate :
16-18 Oct. 2009
Firstpage :
548
Lastpage :
551
Abstract :
N-i-p structure amorphous silicon solar cells deposited on flexible and glass substrates are successfully fabricated at low substrate temperature of 100°C through plasma enhanced chemical vapor deposition (PECVD) system. The external parameters of solar cells are characterized by solar simulator. The results indicate the best dot of the solar cells with glass substrate can reach to 5.54% of conversion efficiency with fill factor of 0.54 and open circuit voltage of 0.9, while the conversion efficiency for flexible solar cells is 4.03% with fill factor of 0.5 and open circuit voltage of 0.82. With conversion efficiencies in the same magnitude, the low temperature deposited flexible solar cells show promising potentials on future large scale applications.
Keywords :
plasma CVD coatings; solar cells; low temperature deposited flexible amorphous silicon solar cells; plasma enhanced chemical vapor deposition; Amorphous silicon; Chemical vapor deposition; Circuit simulation; Flexible printed circuits; Glass; Photovoltaic cells; Plasma chemistry; Plasma simulation; Plasma temperature; Voltage; PECVD; amorphous silicon; flexible solar cells; low temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Energy and Environment Technology, 2009. ICEET '09. International Conference on
Conference_Location :
Guilin, Guangxi
Print_ISBN :
978-0-7695-3819-8
Type :
conf
DOI :
10.1109/ICEET.2009.139
Filename :
5364315
Link To Document :
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