• DocumentCode
    511386
  • Title

    Fabrication of memristors with poly-crystalline silicon nanowires

  • Author

    Jamaa, M. Haykel Ben ; Carrara, Sandro ; Georgiou, Julius ; Archontas, Nikolaos ; De Micheli, Giovanni

  • Author_Institution
    Swiss Fed. Inst. of Technol., EPFL, Lausanne, Switzerland
  • fYear
    2009
  • fDate
    26-30 July 2009
  • Firstpage
    152
  • Lastpage
    154
  • Abstract
    Memristors are the two-terminal components that complete the symmetry between the fundamental circuit variables, and they are highly suitable for bioinspired and neural-network-based computational systems due to their inherent memory effect. In this paper we present a fabrication technique that uses only Complementary Metal Oxide Semiconductor (CMOS) processing steps and conventional photolithography, yielding poly-crystalline silicon nanowires that show a memristive behavior. Besides measurements, we performed numerical device simulations that address the observed memristive effect.
  • Keywords
    elemental semiconductors; field effect transistors; memristors; nanoelectronics; nanowires; photolithography; silicon; Si; ambipolar hysteretic behavior; complementary metal oxide semiconductor processing; memristive effect; memristors; numerical device simulations; photolithography; poly-SiNW field effect transistors; poly-crystalline silicon nanowires; two-terminal components; CMOS process; Circuits; Computational modeling; Fabrication; Lithography; Memristors; Nanowires; Numerical simulation; Performance evaluation; Silicon; SiNWFET; ambipolar; charge trapping; hysterisis; memristor; poly-Si; polycrystalline silicon; silicon nanowire; spacer technique;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on
  • Conference_Location
    Genoa
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4244-4832-6
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • Filename
    5394577