Fabricate planar photonic crystal gradient index lens by laser interference lithography

Author

Tan, Chunlei ; Peng, C.S. ; Zhang, Jin ; Wang Zuobin ; Petryakov, V.N. ; Verevkin, Yu.K. ; Olaizola, Santiago M. ; Berthou, Thierry ; Tisserand, Stéphane

Author_Institution

Optoelectron. Res. Centre, Tampere Univ. of Technol., Tampere, Finland

fYear

2009

fDate

26-30 July 2009

Firstpage

450

Lastpage

453

Abstract

Four-beam laser interference lithography (LIL) was shown to be a good technology to generate graded-index photonic crystals with a square lattice. Characters of the structure vary regularly with the incident angles and relative thresholds. The finite-difference time-domain method was used to validate the focusing behavior of the resultant structure. High intensity enhancement and sub-wavelength focusing were achieved simultaneously. The results suggest to us that LIL is a new low-cost and high-efficiency way of fabricating planar lenses.

Keywords

finite difference time-domain analysis; gradient index optics; laser beam applications; lenses; light interference; optical fabrication; optical focusing; photolithography; photonic crystals; finite-difference time-domain method; four-beam laser interference lithography; graded-index photonic crystals; intensity enhancement; planar lens; planar photonic crystal gradient index lens; subwavelength laser focusing; Finite difference methods; Focusing; Interference; Laser beams; Lattices; Lenses; Lithography; Optical materials; Photonic crystals; Time domain analysis; Graded refractive index photonic crystals; Laser interference lithography; Planar lens;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on

Conference_Location

Genoa

ISSN

1944-9399

Print_ISBN

978-1-4244-4832-6

Electronic_ISBN

1944-9399

Type

conf

Filename

5394711