DocumentCode
511532
Title
Backscattering coefficient in gate-all-around 3C-SiC nanowire FETs
Author
Rogdakis, Konstantinos ; Bano, Edwige ; Pala, Marco G. ; Poli, Stefano ; Zekentes, Konstantinos
Author_Institution
Grenoble INP, IMEP-LAHC, Grenoble, France
fYear
2009
fDate
26-30 July 2009
Firstpage
504
Lastpage
507
Abstract
Numerical simulations of gate-all-around (GAA) 3C-SiC nanowire (NW) field effect transistors (FETs) are presented using a full quantum self-consistent Poisson-Schrodinger algorithm within the non-equilibrium Green´s function (NEGF) formalism. 3C-SiC device performance is benchmarked by a direct comparison with corresponding Si NWFETs. A full quantum treatment of phonon (PH) and surface roughness (SR) scattering is considered and effective mobility extraction is performed both in ballistic and dissipative transport condition deriving an analysis of the backscattering coefficient in linear transport regime. Effective mobility as a function of electron density is found to decrease due to the effect of increasing carrier degeneracy and both phonon and surface-roughness scattering, resulting in an increase of the backscattering coefficient at large gate overdrive.
Keywords
Green´s function methods; Poisson equation; Schrodinger equation; field effect transistors; nanowires; numerical analysis; silicon compounds; wide band gap semiconductors; 3C-SiC nanowire FET; Poisson-Schrodinger algorithm; SiC; backscattering coefficient; electron density; field effect transistors; gate-all-around; linear transport regime; mobility extraction; nonequilibrium Green´s function; numerical simulations; quantum self-consistent; quantum treatment; surface roughness scattering; Backscatter; FETs; Green´s function methods; Nanoscale devices; Numerical simulation; Particle scattering; Phonons; Rough surfaces; Surface roughness; Surface treatment; 3C-SiC; FET; NEGF; mobility; nanowire; phonon scattering; surface roughness scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on
Conference_Location
Genoa
ISSN
1944-9399
Print_ISBN
978-1-4244-4832-6
Electronic_ISBN
1944-9399
Type
conf
Filename
5394725
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