• DocumentCode
    511532
  • Title

    Backscattering coefficient in gate-all-around 3C-SiC nanowire FETs

  • Author

    Rogdakis, Konstantinos ; Bano, Edwige ; Pala, Marco G. ; Poli, Stefano ; Zekentes, Konstantinos

  • Author_Institution
    Grenoble INP, IMEP-LAHC, Grenoble, France
  • fYear
    2009
  • fDate
    26-30 July 2009
  • Firstpage
    504
  • Lastpage
    507
  • Abstract
    Numerical simulations of gate-all-around (GAA) 3C-SiC nanowire (NW) field effect transistors (FETs) are presented using a full quantum self-consistent Poisson-Schrodinger algorithm within the non-equilibrium Green´s function (NEGF) formalism. 3C-SiC device performance is benchmarked by a direct comparison with corresponding Si NWFETs. A full quantum treatment of phonon (PH) and surface roughness (SR) scattering is considered and effective mobility extraction is performed both in ballistic and dissipative transport condition deriving an analysis of the backscattering coefficient in linear transport regime. Effective mobility as a function of electron density is found to decrease due to the effect of increasing carrier degeneracy and both phonon and surface-roughness scattering, resulting in an increase of the backscattering coefficient at large gate overdrive.
  • Keywords
    Green´s function methods; Poisson equation; Schrodinger equation; field effect transistors; nanowires; numerical analysis; silicon compounds; wide band gap semiconductors; 3C-SiC nanowire FET; Poisson-Schrodinger algorithm; SiC; backscattering coefficient; electron density; field effect transistors; gate-all-around; linear transport regime; mobility extraction; nonequilibrium Green´s function; numerical simulations; quantum self-consistent; quantum treatment; surface roughness scattering; Backscatter; FETs; Green´s function methods; Nanoscale devices; Numerical simulation; Particle scattering; Phonons; Rough surfaces; Surface roughness; Surface treatment; 3C-SiC; FET; NEGF; mobility; nanowire; phonon scattering; surface roughness scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on
  • Conference_Location
    Genoa
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4244-4832-6
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • Filename
    5394725