Amorphous-nanocrystalline silicon plasma enhanced CVD grown on porous alumina substrate

Author

Khodin, A. ; Joong-Kee, Lee ; Chang-Sam, Kim ; Sang-Ok, Kim

Author_Institution

Battery Res. Center, Korea Inst. of Sci. & Technol. (KIST), Seoul, South Korea

fYear

2009

fDate

26-30 July 2009

Firstpage

540

Lastpage

542

Abstract

The novel composite amorphous/nanocrystalline thin-film silicon has been fabricated by plasma-enhanced CVD using template porous alumina substrate. The layers possess of specific non-planar morphology and contain silicon nanocrystals of 2-4 nm diameter, as well as Â¿bunchesÂ¿ of elongated nanocrystals composing honeycomb-like net. The results obtained could be used in new composite materials and structures for photovoltaics, photonics and ionics.

Keywords

amorphous semiconductors; composite materials; elemental semiconductors; nanostructured materials; plasma CVD; porous materials; semiconductor thin films; silicon; Al₂O₃; Si; amorphous-nanocrystalline silicon; composite materials; honeycomb-like net; ionics; nonplanar morphology; photonics; photovoltaics; plasma enhanced CVD; porous alumina substrate; semiconductor thin films; Amorphous materials; Composite materials; Morphology; Nanocomposites; Nanocrystals; Photovoltaic cells; Plasma materials processing; Semiconductor thin films; Silicon; Substrates; CVD; alumina; amorphous silicon; composite material; nanocrystals; thin film;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on

Conference_Location

Genoa

ISSN

1944-9399

Print_ISBN

978-1-4244-4832-6

Electronic_ISBN

1944-9399

Type

conf

Filename

5394747