• DocumentCode
    511565
  • Title

    Shrinking solid-state nanopores and nanoslits using electron beam induced deposition with different precursors

  • Author

    Kox, R. ; Chang Chen ; Lagae, Liesbet ; Borghs, G.

  • Author_Institution
    Functional Nano-Syst. (FNS), IMEC, Leuven, Belgium
  • fYear
    2009
  • fDate
    26-30 July 2009
  • Firstpage
    605
  • Lastpage
    608
  • Abstract
    Solid-state nanopores of only a few nanometres in size have been in the spot-light during the last decade because of their potential use in applications such as molecule detection and DNA sequencing. They show greater stability than their biological counterparts, and can therefore be used in a broader range of environments. In most cases, the fabrication of such a nanopore requires the high-energy beam of a transmission electron microscope (TEM) or focused ion beam (FIB) tool to drill or reshape a small hole in a freestanding membrane. Here, we present a novel method to reduce the size of existing nanopores using electron beam induced deposition (EBID) in a conventional scanning electron microscope (SEM). The existing nanopores are etched in a silicon membrane using anisotropic wet etching and can be shrunk down to a few nanometres using EBID. In an unmodified SEM, shrinking can occur using the hydrocarbon contamination as a precursor, but we will show that by using a specifically designed environmental cell, it is possible to introduce different precursors and shrink the pore using almost any material desired.
  • Keywords
    electron beam deposition; etching; focused ion beam technology; nanoporous materials; scanning electron microscopy; transmission electron microscopy; DNA sequencing; anisotropic wet etching; electron beam induced deposition; focused ion beam; molecule detection; nanoslits; scanning electron microscopy; shrinking; solid state nanopores; transmission electron microscopy; Biomembranes; DNA; Electron beams; Nanobioscience; Nanometers; Nanoporous materials; Scanning electron microscopy; Solid state circuits; Transmission electron microscopy; Wet etching; electron-beam induced deposition; nanofabrication; nanopores;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on
  • Conference_Location
    Genoa
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4244-4832-6
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • Filename
    5394759