DocumentCode :
511984
Title :
Photoluminescence properties of Nd-O+-codoped Si-based thin film
Author :
Yuan, Meiling ; Li, Chenf ; Leng, Xinli ; Wang, Qingnian
Author_Institution :
Department of Physics, Nanchang University, Nanchang, 330031, JiangXi, China
Volume :
2009-Supplement
fYear :
2009
fDate :
2-6 Nov. 2009
Firstpage :
1
Lastpage :
6
Abstract :
The photoluminescence(PL) spectra at room temperature for the Si-based samples doped by Nd, O+ by ion implantation are measured.The results show that all the samples possess blue-violet photoluminescence properties under the ultraviolet light excitation and its light emission is stable.The PL spectra has multiple peak structure.The results show the intensity of PL spectra is closely relative to Nd and O+ implantation and to the temperature of thermal annealing.The light emission is more greater for the sample of fisrt O+ then Nd ion-implanted silicon than the one of first Nd then O+ ion-implanted silicon.The light-emitiing mechanism is also analyzed.
Keywords :
Energy measurement; Fluorescence; Inorganic materials; Luminescence; Mechanical factors; Neodymium; Photoluminescence; Semiconductor materials; Semiconductor thin films; Temperature distribution; Nd-O+-codoped; Photoluminescence; Si-based emitting films; light-emitting mechanism;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Communications and Photonics Conference and Exhibition (ACP), 2009 Asia
Conference_Location :
Shanghai, China
Print_ISBN :
978-1-55752-877-3
Electronic_ISBN :
978-1-55752-877-3
Type :
conf
Filename :
5405247
Link To Document :
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