DocumentCode :
51216
Title :
Large On-Current Enhancement in Hetero-Junction Tunnel-FETs via Molar Fraction Grading
Author :
Brocard, Sylvan ; Pala, Marco G. ; Esseni, David
Author_Institution :
IMEP-LAHC, Grenoble INP, Grenoble, France
Volume :
35
Issue :
2
fYear :
2014
fDate :
Feb. 2014
Firstpage :
184
Lastpage :
186
Abstract :
We propose to employ a grading of the molar fraction in the source region of III-V hetero-junction tunnel-FETs as a means to improve the on-current without degrading the subthreshold swing. Our full quantum simulations show that the molar-fraction grading increases the on-current by enlarging the hole wave function penetration from the source to the channel region. We also compare the performance of graded AlGaSb/InAs tunnel FETs and InAs MOSFETs and show that at VDS=0.3 V, the tunnel device can outperform the MOSFET in terms of both on-current and subthreshold slope.
Keywords :
III-V semiconductors; aluminium compounds; field effect transistors; gallium compounds; indium compounds; semiconductor heterojunctions; tunnel transistors; AlGaSb-InAs; III-V FET; MOSFET; channel region; hetero-junction tunnel-FET; hole wave function penetration; large on-current enhancement; molar fraction grading; quantum simulation; source region; voltage 0.3 V; Doping; Indium phosphide; Junctions; MOSFET; Tunnel-FETs; hetero-junctions; molar fraction; quantum transport; tunnel-FET design;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2295884
Filename :
6704728
Link To Document :
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